Series 5200 Polishing Pad

Series 5200 Polishing Pad

FOR USE ON: Silicon Carbide DUROMETER: C Scale 60 +/- 5 points COMPRESSION %: 4% (1/2 lb. force displacement) DENSITY: 0.36 g/cm3 THICKNESS: .050” / 1.27mm DIAMETER: Up To 60” Sheets or Pads   DESCRIPTION: Fibrous non-woven material with excellent surface wear...
HPB-101CC POLISHING PAD

HPB-101CC POLISHING PAD

FOR USE ON: Glass (All types), sapphire, silicon/semiconductor materials, silicon carbide, Ceramics, optics, plastics and some metals. DUROMETER: C Scale 40 +/- 5 points COMPRESSION %: 2-4% (4 lb. force displacement) DENSITY: 0.48 g/cm3 THICKNESS:  .150” / 3.81mm...
HPB-101CC POLISHING PAD

AMG-5 POLISHING PAD

FOR USE ON: Silicon, Sapphire and Silicon Carbide DUROMETER: C Scale 55 +/- 5,  D Scale 36 +/- 5 COMPRESSION %: 1.5-2.5% (1/2 lb. force displacement) DENSITY: .28-.32 g/cm3 THICKNESS: .050” / 1.27mm DIAMETER: Up To 60” Sheets or Pads   DESCRIPTION: Fibrous...
Spartan Warrior Pad

Spartan Warrior Pad

FOR USE ON: The Spartan Warrior Pad is a versatile pad and can be used for most polishing applications by adjusting the polishing process variable parameter. HARDNESS (Scale C): 42 COMPRESSION %: 5% DENSITY: 0.326 g/cm3 THICKNESS: 0.050”-0.220” DIAMETER: Plain up to...
Spartan OMNI-White Polishing Pad

Spartan OMNI-White Polishing Pad

Spartan OMNI-White is a cross-functional polishing pad built to handle both stock removal and final surface generation in a single product — a fibrous, non-woven material with a textured gray surface and micro voids engineered for improved slurry distribution. Used as...
Spar-Lon 2

Spar-Lon 2

FOR USE ON: glass, semiconductors, compound semiconductors and infra-red materials DUROMETER: C Scale 60 COMPRESSION %: 2% (1/2 lb. force displacement) DENSITY: .485 g/cm3 THICKNESS: 0.050” DIAMETER: Up to 60” Sheets or Pads   DESCRIPTION: Spartan Spar-Lon2; Tan...
Spartan Omni-Gray Polishing Pad

Spartan Omni-Gray Polishing Pad

FOR USE ON: Silicon, Sapphire and Silicon Carbide for the 1st step polishing application SURFACE OPTIONS: Plain, grooved, or embossed (up to 36”) COMPRESSION %: 10% DENSITY: 0.300 g/cm³ THICKNESS: 0.050”, 0.090”, 0.125” DIAMETER: up to 60”   DESCRIPTION: Spartan...
HPB-101CC POLISHING PAD

AMS Polishing Pad

FOR USE ON: Silicon Wafers, Cadmium Telluride, Gallium Arsenide, Stainless Steel, Sapphire, Silicon Carbide DUROMETER: Shore C Scale 60 COMPRESSION %: 4-6% (1/2 pound force displacement) DENSITY: .42 g/cm3 THICKNESS: .050″, .090″ and .125″ DIAMETER:...
Poretex 2LN Polishing Pads

Poretex 2LN Polishing Pads

Poretex 2LN is the main workhorse of our final polishing pads. It is a synthetic polishing pad designed specifically for producing ultra-polished surfaces, using a nap-length construction rather than a solid pad geometry. That makes it the right choice when your...
Spartan Durotex

Spartan Durotex

FOR USE ON: designed and manufactured to polish a wide variety of materials in a single-step type process including optics, electro-optics, semiconductor, aluminum discs, LCD/plasma display and ceramic compositions THICKNESS: 0.5 – 2.5mm DENSITY: 0.67 g/cm3 WIDTH: 400...
Series 5200 Polishing Pad

HPC75 Polishing Pad

FOR USE ON: Crystal and Medium Hardness Glass, Quartz, Stainless Steel DUROMETER: Shore C Scale 50 COMPRESSION %: 3-5% (1/2 pound force displacement) DENSITY: .33 g/cm3 THICKNESS: .050” DIAMETER: Up to 60” Sheets or Pads   DESCRIPTION: White or color fiber based...
HPC5080 Polishing Pad

HPC5080 Polishing Pad

FOR USE ON: Hard Glass and Crystal DUROMETER: Shore C Scale 85 COMPRESSION %: 1-3% (1/2 pound force displacement) DENSITY: .85 g/cm3 THICKNESS: .045” DIAMETER: Up to 60” in Sheets or Pads   DESCRIPTION: Yellow color, fiber based resin treated polyurethane pad for...
HPC4545 Polishing Pad

HPC4545 Polishing Pad

FOR USE ON: Silicon Wafers, Cadmium Telluride, Gallium Arsenide, Stainless Steel DUROMETER: Shore C Scale 55 COMPRESSION%: 3-5% (1/2 pound force displacement) DENSITY: .46 g/cm3 THICKNESS: .050” and .150” DIAMETER: Up to 60” in Sheets or Pads DESCRIPTION: White fiber...