Compound Semiconductor Polishing Pads
Poretex 3LN™ Polishing Pads
Poretex 3LN polishing pads are engineered for final-stage polishing of semiconductor, compound semiconductor, sapphire, silicon carbide, and other advanced materials where surface finish tolerances are tightest. Manufactured to consistent, tested specifications,...
Poretex-UT™ Polishing Pads
Poretex-UT polishing pads deliver high-hardness performance. These pads are in the same class as Poretex 2LN and 3LN, engineered for final-stage polishing of semiconductor, compound semiconductor, sapphire, silicon carbide, and other advanced materials. The difference...
Spartan OMNI-White Polishing Pad
Spartan OMNI-White is a cross-functional polishing pad built to handle both stock removal and final surface generation in a single product — a fibrous, non-woven material with a textured gray surface and micro voids engineered for improved slurry distribution. Used as...
Poretex 2LN Polishing Pads
Poretex 2LN is the main workhorse of our final polishing pads. It is a synthetic polishing pad designed specifically for producing ultra-polished surfaces, using a nap-length construction rather than a solid pad geometry. That makes it the right choice when your...
