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Poretex 3LN™ Polishing Pads

Poretex 3LN™ Polishing Pads

FOR USE ON: semiconductor, compound semiconductor, sapphire, silicon carbide, ceramic and other advanced materials HARDNESS (Scale C): 65 +/- 3 COMPRESSIBILITY (%): 3.9 +/- 0.8 COMPRESSIVE ELASTIC MODULUS, (%): 70 +/- 10 Weight: 522 +/- 50 grams/square meter...
Poretex-UT™ Polishing Pads

Poretex-UT™ Polishing Pads

FOR USE ON: semiconductor, compound semiconductor, sapphire, silicon carbide, ceramic and other advanced materials HARDNESS (Scale C): 65 +/- 3 COMPRESSIBILITY (%): 3.9 +/- 0.8 COMPRESSIVE ELASTIC MODULUS, (%): 70 +/- 10 Weight: 522 +/- 50 grams/square meter...
AMG-5 POLISHING PAD

AMG-5 POLISHING PAD

FOR USE ON: Silicon, Sapphire and Silicon Carbide DUROMETER: C Scale 55 +/- 5,  D Scale 36 +/- 5 COMPRESSION %: 1.5-2.5% (1/2 lb. force displacement) DENSITY: .28-.32 g/cm3 THICKNESS: .050” / 1.27mm DIAMETER: Up To 60” Sheets or Pads   DESCRIPTION: Fibrous...
Spartan Warrior Pad

Spartan Warrior Pad

FOR USE ON: The Spartan Warrior Pad is a versatile pad and can be used for most polishing applications by adjusting the polishing process variable parameter. HARDNESS (Scale C): 42 COMPRESSION %: 5% DENSITY: 0.326 g/cm3 THICKNESS: 0.050”-0.220” DIAMETER: Plain up to...
Spartan OMNI-White Polishing Pad

Spartan OMNI-White Polishing Pad

FOR USE ON: Optical, electro-optical, metals, semiconductor, compound semiconductor and ceramic materials as a gentle stock removal pad or a final polishing pad. HARDNESS (Scale C): 55 – 60 COMPRESSION %: 11-13% DENSITY: 0.383-0.468 g/cm3 THICKNESS: 0.050”,...
Spar-Lon 2

Spar-Lon 2

FOR USE ON: This final polishing pad can be used on sapphire, glass, plastics, ceramics, and metals with a variety of abrasive slurries. DUROMETER: 80º Shore A COMPRESSION %: 4% (2 pound Displacement) DENSITY: .0.40 g/cm3 THICKNESS: .050” +/- .001” DIAMETER: Up to 58”...
Spartan Omni-Gray Polishing Pad

Spartan Omni-Gray Polishing Pad

FOR USE ON: Silicon, Sapphire and Silicon Carbide for the 1st step polishing application SURFACE OPTIONS: Plain, grooved, or embossed (up to 36”) COMPRESSION %: 10% DENSITY: 0.300 g/cm³ THICKNESS: 0.050”, 0.090”, 0.125” DIAMETER: up to 60”   DESCRIPTION: Spartan...
Acry-Met-1 Polishing Pad

Acry-Met-1 Polishing Pad

DESCRIPTION: Buffed polyurethane pad for polishing plastics or metals with aluminum oxide. A “middle step” polishing pad. HARDNESS: 67 Shore A THICKNESS: 1.2mm
HPB35 Polishing Pad

HPB35 Polishing Pad

FOR USE ON: Art Glass, Soft Scientific Glass and Polycarbonate DUROMETER: Shore C Scale 35 COMPRESSION %: 5-7% (4 pound force displacement) DENSITY: .35 g/cm3 THICKNESS: .125” and .275” DIAMETER: Up to 60” Sheets or Pads DESCRIPTION: White fiber based resin treated...
HPB75 Polishing Pad

HPB75 Polishing Pad

FOR USE ON: Hand Held Machines/Low to medium pressure applications DUROMETER: Shore C Scale 40 COMPRESSION %: 2-4% (4 pound force displacement) DENSITY: .37 g/cm3 THICKNESS: .090” and .150” DIAMETER: Up to 60” Sheets or Pads   DESCRIPTION: White fiber based resin...
Silk-Met-1 Polishing Pad

Silk-Met-1 Polishing Pad

DESCRIPTION: Woven artificial silk pad for metallographic polishing using diamond slurries under 10 microns. Can be used with water or oil based slurries.
Blue Dia-Met-1 Polishing Pad

Blue Dia-Met-1 Polishing Pad

DESCRIPTION: A “final polishing pad” (flocked) to be used with diamond slurries or pastes 3 microns or under. HARDNESS: 40 Shore A THICKNESS: 1mm FIBER HEIGHT : 0.75mm
AMG-5 POLISHING PAD

AMS Polishing Pad

FOR USE ON: Silicon Wafers, Cadmium Telluride, Gallium Arsenide, Stainless Steel, Sapphire, Silicon Carbide DUROMETER: Shore C Scale 60 COMPRESSION %: 4-6% (1/2 pound force displacement) DENSITY: .42 g/cm3 THICKNESS: .050″, .090″ and .125″ DIAMETER:...
Poretex 3LN™ Polishing Pads

Poretex 2LN Polishing Pads

FOR USE ON: Used to produce ultra polished surfaces with synthetic padsNAP LENGTH: » 50 μWEIGHT: 570 +/50 grams/linear yd.COMPRESSION %: 4.5 +/2.0%DENSITY: 0.42 +/0.05 g/cm3THICKNESS: 450 +/80μ mmDIAMETER: Precut or 53” wide rolls   DESCRIPTION: In the surface...
Spartan Durotex

Spartan Durotex

FOR USE ON: designed and manufactured to polish a wide variety of materials in a single-step type process including optics, electro-optics, semiconductor, aluminum discs, LCD/plasma display and ceramic compositions THICKNESS: 0.5 – 2.5mm DENSITY: 0.67 g/cm3 WIDTH: 400...
Spartan Spar-Lon-Red Pads

Spartan Spar-Lon-Red Pads

FOR USE ON: This final polishing pad can be used on sapphire, glass, plastics, ceramics, and metals with a variety of abrasive slurries.DUROMETER: 80º Shore ACOMPRESSION %: 4% (2 pound Displacement)DENSITY: .0.40 g/cm3THICKNESS: .050” +/- .001”DIAMETER: Up to 58” Pads...
HPC75 Polishing Pad

HPC75 Polishing Pad

FOR USE ON: Crystal and Medium Hardness Glass, Quartz, Stainless Steel DUROMETER: Shore C Scale 50 COMPRESSION %: 3-5% (1/2 pound force displacement) DENSITY: .33 g/cm3 THICKNESS: .050” DIAMETER: Up to 60” Sheets or Pads   DESCRIPTION: White or color fiber based...
HPC5080 Polishing Pad

HPC5080 Polishing Pad

FOR USE ON: Hard Glass and Crystal DUROMETER: Shore C Scale 85 COMPRESSION %: 1-3% (1/2 pound force displacement) DENSITY: .85 g/cm3 THICKNESS: .045” DIAMETER: Up to 60” in Sheets or Pads   DESCRIPTION: Yellow color, fiber based resin treated polyurethane pad for...
HPB35 Polishing Pad

HPB6040 Polishing Pad

FOR USE ON: Great for hand held machines and for use on low to medium pressure applications for fragile and delicate items. DUROMETER: Shore C Scale 40 COMPRESSION %: 4-6% (4 pound force displacement) DENSITY: .39 g/cm3 THICKNESS: .125” and .180” DIAMETER: Up to 60”...